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Ting‐Chang Chang

Researcher Next ID · RN-019129

Researcher · Engineering

ON Semiconductor (United States)

Phoenix, Taiwan

Not currently recruitingFunding unknown
Works count
891
Citation count
23,395
H-index
62
i10-index
390

Research interests

Engineering
Semiconductor materials and devices
Thin-Film Transistor Technologies
Advanced Memory and Neural Computing
Ferroelectric and Negative Capacitance Devices
Advancements in Semiconductor Devices and Circuit Design

Publications

  • An electro-photo-sensitive synaptic transistor for edge neuromorphic visual systems

    Nanoscale · 2019 · 10.1039/c9nr04195h

  • Optoelectronic neuromorphic thin-film transistors capable of selective attention and with ultra-low power dissipation

    Nano Energy · 2019 · 10.1016/j.nanoen.2019.06.007

  • High-Performance Visible-Blind Ultraviolet Photodetector Based on IGZO TFT Coupled with p–n Heterojunction

    ACS Applied Materials & Interfaces · 2018 · 10.1021/acsami.7b16498

  • Functionally Complete Boolean Logic in 1T1R Resistive Random Access Memory

    IEEE Electron Device Letters · 2016 · 10.1109/led.2016.2645946

  • Physical and chemical mechanisms in oxide-based resistance random access memory

    Nanoscale Research Letters · 2015 · 10.1186/s11671-015-0740-7

  • Resistance random access memory

    Materials Today · 2015 · 10.1016/j.mattod.2015.11.009

  • Biorealistic Implementation of Synaptic Functions with Oxide Memristors through Internal Ionic Dynamics

    Advanced Functional Materials · 2015 · 10.1002/adfm.201501427

  • Integrated One Diode–One Resistor Architecture in Nanopillar SiOx Resistive Switching Memory by Nanosphere Lithography

    Nano Letters · 2013 · 10.1021/nl404160u

  • Building Neuromorphic Circuits with Memristive Devices

    IEEE Circuits and Systems Magazine · 2013 · 10.1109/mcas.2013.2256260

  • Atomic-level quantized reaction of HfO x memristor

    Applied Physics Letters · 2013 · 10.1063/1.4802821

  • Observation of conducting filament growth in nanoscale resistive memories

    Nature Communications · 2012 · https://doi.org/10.1038/ncomms1737

  • Developments in nanocrystal memory

    Materials Today · 2011 · 10.1016/s1369-7021(11)70302-9

  • Redox Reaction Switching Mechanism in RRAM Device With $\hbox{Pt/CoSiO}_{X}\hbox{/}\hbox{TiN}$ Structure

    IEEE Electron Device Letters · 2011 · 10.1109/led.2011.2104936

  • Investigating the degradation behavior caused by charge trapping effect under DC and AC gate-bias stress for InGaZnO thin film transistor

    Applied Physics Letters · 2011 · 10.1063/1.3609873

  • Synaptic behaviors and modeling of a metal oxide memristive device

    Applied Physics A · 2011 · 10.1007/s00339-011-6296-1

  • Short-Term Memory to Long-Term Memory Transition in a Nanoscale Memristor

    ACS Nano · 2011 · https://doi.org/10.1021/nn202983n

  • Light-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition

    Applied Physics Letters · 2010 · 10.1063/1.3514251

  • Nanoscale Memristor Device as Synapse in Neuromorphic Systems

    Nano Letters · 2010 · https://doi.org/10.1021/nl904092h

  • Influence of electrode material on the resistive memory switching property of indium gallium zinc oxide thin films

    Applied Physics Letters · 2010 · 10.1063/1.3456379

  • Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress

    Applied Physics Letters · 2010 · 10.1063/1.3481676

  • Influence of positive bias stress on N2O plasma improved InGaZnO thin film transistor

    Applied Physics Letters · 2010 · 10.1063/1.3453870

  • Multilevel resistive switching in Ti/CuxO/Pt memory devices

    Journal of Applied Physics · 2010 · 10.1063/1.3518514

  • Hydrogen-induced improvements in electrical characteristics of a-IGZO thin-film transistors

    Solid-State Electronics · 2010 · 10.1016/j.sse.2010.08.001

  • Bias-induced oxygen adsorption in zinc tin oxide thin film transistors under dynamic stress

    Applied Physics Letters · 2010 · 10.1063/1.3457996

  • Bipolar Resistive Switching Characteristics of Transparent Indium Gallium Zinc Oxide Resistive Random Access Memory

    Electrochemical and Solid-State Letters · 2010 · 10.1149/1.3360181

Current projects

    No projects listed.