Markku Leskelä

Research interests

Publications

• Atomic Layer Deposition of Noble Metals and Their Oxides

  Chemistry of Materials · 2013 · https://doi.org/10.1021/cm402221y

• Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

  Journal of Applied Physics · 2013 · https://doi.org/10.1063/1.4757907

• A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes

  Nature Chemistry · 2013 · https://doi.org/10.1038/nchem.1693

• WO3 photocatalysts: Influence of structure and composition

  Journal of Catalysis · 2012 · https://doi.org/10.1016/j.jcat.2012.07.013

• Atomic Layer Deposition of High‐k Oxides of the Group 4 Metals for Memory Applications

  Advanced Engineering Materials · 2009 · https://doi.org/10.1002/adem.200800316

• Molecular Tweezers for Hydrogen: Synthesis, Characterization, and Reactivity

  Journal of the American Chemical Society · 2008 · https://doi.org/10.1021/ja806627s

• Facile Heterolytic H2 Activation by Amines and B(C6F5)3

  Angewandte Chemie International Edition · 2008 · https://doi.org/10.1002/anie.200800935

• Recent developments in the MOCVD and ALD of rare earth oxides and silicates

  Materials Science and Engineering B · 2005 · https://doi.org/10.1016/j.mseb.2004.12.081

• Rare-earth oxide thin films for gate dielectrics in microelectronics

  Journal of Alloys and Compounds · 2005 · https://doi.org/10.1016/j.jallcom.2005.10.061

• Thin Film Deposition Methods for CuInSe 2 Solar Cells

  Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 2005 · https://doi.org/10.1080/10408430590918341

• Crystallization in hafnia‐ and zirconia‐based systems

  physica status solidi (b) · 2004 · https://doi.org/10.1002/pssb.200404935

• Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

  Chemical Vapor Deposition · 2004 · https://doi.org/10.1002/cvde.200306289

• Atomic Layer Deposition of Platinum Thin Films

  Chemistry of Materials · 2003 · https://doi.org/10.1021/cm021333t

• Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

  Angewandte Chemie International Edition · 2003 · https://doi.org/10.1002/anie.200301652

• Ruthenium Thin Films Grown by Atomic Layer Deposition

  Chemical Vapor Deposition · 2003 · https://doi.org/10.1002/cvde.200290007

• Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum

  Electrochemical and Solid-State Letters · 2003 · https://doi.org/10.1149/1.1595312

• Atomic layer deposition (ALD): from precursors to thin film structures

  Thin Solid Films · 2002 · https://doi.org/10.1016/s0040-6090(02)00117-7

• Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

  Thin Solid Films · 2002 · https://doi.org/10.1016/s0040-6090(02)00612-0

• Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

  Chemical Vapor Deposition · 2002 · https://doi.org/10.1002/1521-3862(20020903)8:5<199::aid-cvde199>3.0.co;2-u

• Atomic layer deposition

  Elsevier eBooks · 2002 · https://doi.org/10.1016/b978-012512908-4/50005-9

• New C 2 v - and Chiral C 2 -Symmetric Olefin Polymerization Catalysts Based on Nickel(II) and Palladium(II) Diimine Complexes Bearing 2,6-Diphenyl Aniline Moieties: Synthesis, Structural Characterization, and First Insight into Polymerization Properties

  Organometallics · 2001 · https://doi.org/10.1021/om010001f

• Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

  Applied Surface Science · 2000 · https://doi.org/10.1016/s0169-4332(00)00274-9

• Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

  Science · 2000 · https://doi.org/10.1126/science.288.5464.319

• Effect of water dose on the atomic layer deposition rate of oxide thin films

  Thin Solid Films · 2000 · https://doi.org/10.1016/s0040-6090(00)00890-7

• Pyridinylimine-based nickel(II) and palladium(II) complexes: preparation, structural characterization and use as alkene polymerization catalysts

  Journal of Organometallic Chemistry · 2000 · https://doi.org/10.1016/s0022-328x(00)00291-6

• Atomic layer epitaxy - a valuable tool for nanotechnology?

  Nanotechnology · 1999 · https://doi.org/10.1088/0957-4484/10/1/005

• Controlled Growth of TaN, Ta3N5, and TaOxNy Thin Films by Atomic Layer Deposition

  Chemistry of Materials · 1999 · https://doi.org/10.1021/cm980760x

• Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

  Chemical Vapor Deposition · 1999 · https://doi.org/10.1002/(sici)1521-3862(199901)5:1<7::aid-cvde7>3.0.co;2-j

• Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

  Applied Physics Letters · 1996 · https://doi.org/10.1063/1.115990

• Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy

  Thin Solid Films · 1994 · https://doi.org/10.1016/0040-6090(94)90168-6

• Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

  Chemistry of Materials · 1993 · https://doi.org/10.1021/cm00032a023

• Growth of titanium dioxide thin films by atomic layer epitaxy

  Thin Solid Films · 1993 · https://doi.org/10.1016/0040-6090(93)90172-l

Current projects

No projects listed.