M. C. M. van de Sanden

Research interests

Publications

• The 2022 Plasma Roadmap: low temperature plasma science and technology

  Journal of Physics D Applied Physics · 2022 · https://doi.org/10.1088/1361-6463/ac5e1c

• In Situ Observation of Nanoparticle Exsolution from Perovskite Oxides: From Atomic Scale Mechanistic Insight to Nanostructure Tailoring

  ACS Nano · 2019 · https://doi.org/10.1021/acsnano.9b05652

• The 2017 Plasma Roadmap: Low temperature plasma science and technology

  Journal of Physics D Applied Physics · 2017 · https://doi.org/10.1088/1361-6463/aa76f5

• Plasma‐driven dissociation of CO 2 for fuel synthesis

  Plasma Processes and Polymers · 2016 · https://doi.org/10.1002/ppap.201600126

• Taming microwave plasma to beat thermodynamics in CO 2 dissociation

  Faraday Discussions · 2015 · https://doi.org/10.1039/c5fd00045a

• Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface

  Journal of Applied Physics · 2012 · https://doi.org/10.1063/1.4709729

• Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

  Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · https://doi.org/10.1116/1.3609974

• Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

  Applied Physics Letters · 2010 · https://doi.org/10.1063/1.3497014

• Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

  Journal of The Electrochemical Society · 2010 · https://doi.org/10.1149/1.3428705

• Optical constants of graphene measured by spectroscopic ellipsometry

  Applied Physics Letters · 2010 · https://doi.org/10.1063/1.3475393

• Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

  Journal of The Electrochemical Society · 2010 · https://doi.org/10.1149/1.3491381

• Influence of the Deposition Temperature on the c-Si Surface Passivation by Al[sub 2]O[sub 3] Films Synthesized by ALD and PECVD

  Electrochemical and Solid-State Letters · 2010 · https://doi.org/10.1149/1.3276040

• In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

  Journal of Physics D Applied Physics · 2009 · https://doi.org/10.1088/0022-3727/42/7/073001

• Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

  physica status solidi (RRL) - Rapid Research Letters · 2009 · https://doi.org/10.1002/pssr.200903334

• On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

  Journal of Applied Physics · 2008 · https://doi.org/10.1063/1.3021091

• Silicon surface passivation by atomic layer deposited Al2O3

  Journal of Applied Physics · 2008 · https://doi.org/10.1063/1.2963707

• Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

  Progress in Photovoltaics Research and Applications · 2008 · https://doi.org/10.1002/pip.823

• High efficiency n-type Si solar cells on Al2O3-passivated boron emitters

  Applied Physics Letters · 2008 · https://doi.org/10.1063/1.2945287

• Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

  Journal of The Electrochemical Society · 2007 · https://doi.org/10.1149/1.2737629

• Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

  Applied Physics Letters · 2007 · https://doi.org/10.1063/1.2784168

• Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

  Applied Physics Letters · 2006 · https://doi.org/10.1063/1.2338776

• Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

  Applied Physics Letters · 2006 · https://doi.org/10.1063/1.2240736

• Vacancies and voids in hydrogenated amorphous silicon

  Applied Physics Letters · 2003 · https://doi.org/10.1063/1.1559657

• Determining the material structure of microcrystalline silicon from Raman spectra

  Journal of Applied Physics · 2003 · https://doi.org/10.1063/1.1596364

• X-Ray photoelectron spectroscopy reference data for identification of the C3N4 phase in carbon–nitrogen films

  Diamond and Related Materials · 2000 · https://doi.org/10.1016/s0925-9635(00)00345-9

Current projects

No projects listed.