Yee‐Chia Yeo
Researcher Next ID · RN-036873
Researcher · Engineering
Agency for Science, Technology and Research
Singapore, Singapore
- Works count
- 659
- Citation count
- 13,671
- H-index
- 54
- i10-index
- 296
Research interests
Publications
Spin–orbit proximity effect in graphene
Nature Communications · 2014 · https://doi.org/10.1038/ncomms5875
Breaking the Speed Limits of Phase-Change Memory
Science · 2012 · https://doi.org/10.1126/science.1221561
Electronic band structure and effective mass parameters of Ge1-xSnx alloys
Journal of Applied Physics · 2012 · 10.1063/1.4767381
Tunneling Field-Effect Transistor: Capacitance Components and Modeling
IEEE Electron Device Letters · 2010 · 10.1109/led.2010.2047240
Device physics and design of germanium tunneling field-effect transistor with source and drain engineering for low power and high performance applications
Journal of Applied Physics · 2008 · https://doi.org/10.1063/1.2924413
Device physics and design of double-gate tunneling field-effect transistor by silicon film thickness optimization
Applied Physics Letters · 2007 · https://doi.org/10.1063/1.2748366
Characterization and Physical Origin of Fast Vth Transient in NBTI of pMOSFETs with SiON Dielectric
· 2006 · 10.1109/iedm.2006.346776
Controlled insulator-to-metal transformation in printable polymer composites with nanometal clusters
Nature Materials · 2006 · 10.1038/nmat1806
5nm-gate nanowire FinFET
· 2004 · 10.1109/vlsit.2004.1345476
MOSFET gate leakage modeling and selection guide for alternative gate dielectrics based on leakage considerations
IEEE Transactions on Electron Devices · 2003 · 10.1109/ted.2003.812504
25 nm CMOS Omega FETs
Journal · 2003 · https://doi.org/10.1109/iedm.2002.1175826
Direct tunneling leakage current and scalability of alternative gate dielectrics
Applied Physics Letters · 2002 · 10.1063/1.1506941
Metal-dielectric band alignment and its implications for metal gate complementary metal-oxide-semiconductor technology
Journal of Applied Physics · 2002 · https://doi.org/10.1063/1.1521517
Effects of high-/spl kappa/ gate dielectric materials on metal and silicon gate workfunctions
IEEE Electron Device Letters · 2002 · 10.1109/led.2002.1004229
Direct tunneling gate leakage current in transistors with ultrathin silicon nitride gate dielectric
IEEE Electron Device Letters · 2000 · 10.1109/55.877204
Electronic band structures and effective-mass parameters of wurtzite GaN and InN
Journal of Applied Physics · 1998 · https://doi.org/10.1063/1.366847
Current projects
No projects listed.